KSV Minitrough System 2

Small and cost-efficient design with capabilities of a full-sized instrument

For deposition of multilayer LB-films and conventional monolayer studies

Choose between computer controlled unsupervised or manual film deposition


Additional info
Download Brochure (pdf)
Available Accessories
Software information
Terms Explained
Monolayer
Langmuir Film (monolayer)
Langmuir-Blodgett Film
Langmuir Film Balance & Langmuir Trough
Self-Assembly
Self-Assembled Monolayer
Interfacial Rheology
Nanoscience
Nanotechnology
Isotherm
Deposition

KSV Minitrough System 2

- The Small-Scale Langmuir-Blodgett Instrument

PC-controlled Langmuir-Blodgett instrument for unsupervised fabrication of multilayer LB-films on solid substrates and for analysis of monolayers. 

Configuration includes:

  • KSV Minitrough Control Module
  • Dipping trough
  • Barriers
  • Dipper
  • Film balance
  • Barrier drive

Unique fieatures

  • A dipping well in the centre of the trough
  • Dipper, a dipping device, fully automatic and software controlled.

Common Features

  • Symmetric or single-sided compression of the monolayer by two inter-linked surface barriers
  • Leak-proof hydrophilic Delrin barriers
  • Form-sintered single piece, non-porous PTFE trough. Surface area 273cm2, (365mm x 75 mm)
  • Subphase temperature control facility by aluminum heating/cooling base plate operated by external circulating water bath. Bath sold separately
  • Digital display of surface pressure
  • Super-sensitive film balance with Platinum Wilhelmy plate (51066), 100 paper plates (51066FP) and a hook for paper plates (51066FPH)
  • Complete KSV WINLB software for Windows operating systems
  • Comprehensive instruction manual and instructional video CD on how to set up the instrument and get started with  measurements (or for use in undergraduate experiments)
  • Complete starter kit to make initial measurements (see accessory KSV-LBKIT)

Specifications
Film balance measuring range   0 to 250 mN/m
Film balance resolution   0.004 mN/m
Barrier compression speed   0.1 to 200 mm/min (symmetric compression)
Max. Substrate size
  60 x 35 mm (100 % immersion)
Speed adjustment
  0.1 mm/min increments
Deposition cycles
  1 to unlimited
Max stroke of arm
  75 mm
Delay times
  adjustable from 0 to 9999 s (upper and lower delays can be adjusted separetely)
Effective trough dimensions   365 x 75 mm
Subphase volume   0.160 l without the well

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