KSV Minimicro
System 2


Optimal size/performance ratio and cost-efficiency

For conventional monolayer analysis with small subphase volumes and small amounts of material

For unsupervised deposition of multiple monolayers on solid substrates


Additional info
Download Brochure (pdf)
Available Accessories
Software information
Terms Explained
Monolayer
Langmuir Film (monolayer)
Langmuir-Blodgett Film
Langmuir Film Balance & Langmuir Trough
Self-Assembly
Self-Assembled Monolayer
Interfacial Rheology
Nanoscience
Nanotechnology
Isotherm
Deposition

KSV Minimicro System 2

- Miniature Langmuir-Blodgett Instrument

PC-controlled Langmuir-Blodgett trough for fully automatic deposition of Langmuir-Blodgett films on solid substrates.  Also performs the same measurements as Minimicro System 1.

Configuration includes

 
  • The KSV MiniMicro Control Module
  • Barrier drive
  • Film balance
  • Dipper
  • Dipping trough
 

Unique Features

  • A Dipping well in the centre of the trough
  • Injection port to inject the solution to the subphase

Common features

  • Symmetric compression of the monolayer by two inter-linked surface barriers
  • Leak proof hydrophilic Delrin barriers
  • Form-sintered single-piece, non-porous PTFE trough, surface area 100 cm2,(L195 x W51 x D4)
  • Subphase temperature control facilitated by aluminum heating/cooling base-plate controlled by external circulating water bath (bath sold separately)
  • Super-sensitive film balance with platinum Wilhelmy plate (51066), 100 paper plates (51066FP) and hook for the paper plates (51066FPH) 
  • Digital display of surface pressure
  • Complete KSV WINLB software for Windows operating systems
  • Comprehensive instruction manual and instructional video CD on how to set up the instrument and make basic measurements
  • Complete starter kit to make initial measurements (see accessory KSV-LBKIT)

Specifications
Film balance measuring range   0 to 250 mN/m
Film balance resolution   0.004 mN/m
Barrier compression speed   0.02 to 200 mm/min (symmetric compression)
Dipping well dimensions   10 x 28 x 28 mm (L x W x H)
Max. Substrate size
  25 x 25 mm
Speed adjustment
  0.1 mm/min increments
Deposition cycles
  1 to unlimited
Max stroke of arm
  75 mm
Delay times
  adjustable from 0 to 9999 s (upper and lower delays can be adjusted separetely)
Effective trough dimensions   195 x 51 mm
Subphase volume   0.048 l with the well

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