KSV 5000 System 3 LV

Modified version of the KSV 5000 System 3 designed specially for low volume studies


Additional info
Download Brochure (pdf)
Available Accessories
Software information
Terms Explained
Monolayer
Langmuir Film (monolayer)
Langmuir-Blodgett Film
Langmuir Film Balance & Langmuir Trough
Self-Assembly
Self-Assembled Monolayer
Interfacial Rheology
Nanoscience
Nanotechnology
Isotherm
Deposition

KSV 5000 System 3 LV

- Alternate multilayer LB system with Low Volume trough

Low volume trough option to KSV5000 system 3 including modified dipper. Total film area 780 cm2 in two separate compartments (A/B) each 390 cm2, 600 x 65 mm with a dipping well in the center. Subphase volume 1 litre. Max. size of substrate 20 x 45 mm. Other specifications as in KSV5000 System 3.

 

Specifications
Film balance measuring range   0 to 250 mN/m
Film balance resolution   0.004 mN/m
Barrier compression speed   0.1 to 800 mm/min (single sided compression)
0.1 to 400 mm/min (symmetric compression)
Dipping well dimensions
  37 x 116 x 93 mm (W x L x D)
Max. Substrate size
  100 x 100 mm
Deposition speed
  0.1 to 85 or 0.2 to 170 mm/min
Speed adjustment
  0.1 mm/min increments
Deposition cycles
  1 to unlimited
Max stroke of arm
  145 mm
Delay times
  adjustable from 0 to 9999 s
Dipper motors
  4 Servo controlled DC motors
Effective trough dimensions   2 x (775 x 120 mm)
Trough volume   5.5 l
Subphase temperature control
  0 to 60 degrees Celsius (by external bath)

Back

© 2010 KSV Instruments Ltd. All rights reserved. Disclaimer