KSV 5000 System 3

For Unsupervised deposition of ordered layers of two different monolayer molecules

For unsupervised deposition of ordered multilayer LB films

For conventional monolayer analysis and Langmuir film experiments

For Biomembrane and enzyme kinetic reaction studies


Additional info
Download Brochure (pdf)
Available Accessories
Software information
Terms Explained
Monolayer
Langmuir Film (monolayer)
Langmuir-Blodgett Film
Langmuir Film Balance & Langmuir Trough
Self-Assembly
Self-Assembled Monolayer
Interfacial Rheology
Nanoscience
Nanotechnology
Isotherm
Deposition

KSV 5000 System 3

- Alternate multilayer LB system

PC controlled instrument for of unsupervised deposition of alternating Langmuir-Blodgett films, deposition of monolayers and Langmuir-film experiments. Stable backing frame with motorized height elevators for accurate positioning of the film balance and dipping mechanism at the air-water interface.

Configuration includes:

  • The KSV 5000 Control Module
  • An alternate layer module

Unique Features

  • Glue free sealing of the dipping well
  • Dipper for fully automatic and software controlled LB-film depositions onto solid substrates

Common features

  • Symmetrical or one-sided barrier compression with two inter-linked surface barriers
  • Hydrophilic Delrin barriers that prevent leakage under the barrier during compression
  • Form-sintered single piece, non-porous PTFE trough
  • Super sensitive film balance with platinum Wilhelmy plate and 100 paper plates and paper plate hook
  • Complete KSV WINLB software for Windows operating systems
  • Comprehensive instructions manual and instructional video CD on how to set up the instrument and how to make basic experiments
  • A Complete starter kit to make first experiments (see accessory KSV-LBKIT)
  • Subphase temperature control facilitated by aluminum heat/cool base plate operated by external circulating water bath (sold separately)
  • Remote control keypad for operation of the instrument without PC control (sold separately)

 

Specifications
Film balance measuring range   0 to 250 mN/m
Film balance resolution   0.004 mN/m
Barrier compression speed   0.1 to 800 mm/min (single sided compression)
0.1 to 400 mm/min (symmetric compression)
Dipping well dimensions
  37 x 116 x 93 mm (W x L x D)
Max. Substrate size
  100 x 100 mm
Deposition speed
  0.1 to 85 or 0.2 to 170 mm/min
Speed adjustment
  0.1 mm/min increments
Deposition cycles
  1 to unlimited
Max stroke of arm
  145 mm
Delay times
  adjustable from 0 to 9999 s
Dipper motors
  4 Servo controlled DC motors
Effective trough dimensions   2 x (775 x 120 mm)
Trough volume   5.5 l
Subphase temperature control
  0 to 60 degrees Celsius (by external bath)

Back

© 2009 KSV Instruments Ltd. All rights reserved. Disclaimer