KSV 5000 System 2

For unsupervised deposition of ordered multilayer LB films

For conventional monolayer analysis and Langmuir film experiments

For Biomembrane and enzyme kinetic reaction studies

Upgradable to system 3


Additional info
Download Brochure (pdf)
Available Accessories
Software information
Terms Explained
Monolayer
Langmuir Film (monolayer)
Langmuir-Blodgett Film
Langmuir Film Balance & Langmuir Trough
Self-Assembly
Self-Assembled Monolayer
Interfacial Rheology
Nanoscience
Nanotechnology
Isotherm
Deposition

KSV 5000 System 2

 - The Full Size Langmuir-Blodgett Instrument

PC controlled fully automatic Langmuir-Blodgett device for unsupervised fabrication of multilayer LB-films on solid substrates and for analysis of monolayers. Stable backing frame with motorized height elevators for accurate positioning of the film balance and dipping mechanism onto the air-water interface.

Configuration includes:

  • The KSV 5000 Control Module
  • A Film balance system
  • A Film deposition system
  • A symmetric compression trough with a dipping well

Unique Features

  • Glue free sealing of the dipping well
  • Dipper for fully automatic and software controlled LB-film depositions on solid substrates

Common features

  • Symmetrical or one-sided barrier compression with two inter-linked surface barriers
  • Hydrophilic Delrin barriers that prevent leakage under the barrier during compression
  • Form-sintered single piece, non-porous PTFE trough
  • Super-sensitive film balance with platinum Wilhelmy plate and 100 paper plates and paper plate hook
  • Complete KSV WINLB software for Windows operating systems
  • Comprehensive instructions manual and instructional video CD on how to set up the instrument and how to make basic experiments
  • A Complete starter kit to make first experiments (see accessory KSV-LBKIT)
  • Subphase temperature control facilitated by aluminum heat/cool base plate operated by external circulating water bath (sold separately)
  • Remote control keypad for operation of the instrument without PC control (sold separately)

 

Specifications
Film balance measuring range   0 to 250 mN/m
Film balance resolution   0.004 mN/m
Barrier compression speed   0.1 to 800 mm/min (single sided compression)
0.1 to 400 mm/min (symmetric compression)
Dipping well dimensions
  37 x 116 x 93 mm (W x L x D)
Max. Substrate size
  100 x 100 mm
Deposition speed
  0.1 to 85 or 0.2 to 170 mm/min
Speed adjustment
  0.1 mm/min increments
Deposition cycles
  1 to unlimited
Max stroke of arm
  145 mm
Delay times
  adjustable from 0 to 9999 s
Dipper motors
  Servo controlled DC motors
Effective trough dimensions   530 mm x 150 mm (with dipping well)
Trough volume   0.95 l
Subphase temperature control
  0 to 60 degrees Celsius (by external bath)

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