KSV 2000 System 3

For Unsupervised deposition of ordered layers of two different monolayers

For unsupervised deposition of ordered multilayer LB films

For conventional monolayer analysis and Langmuir film experiments

For Biomembrane and enzyme kinetic reaction studies


Additional info
Download Brochure (pdf)
Available Accessories
Software information
Terms Explained
Monolayer
Langmuir Film (monolayer)
Langmuir-Blodgett Film
Langmuir Film Balance & Langmuir Trough
Self-Assembly
Self-Assembled Monolayer
Interfacial Rheology
Nanoscience
Nanotechnology
Isotherm
Deposition

KSV 2000 System 3 - Alternating multilayer LB system

Alternating Multilayer Langmuir-Blodgett system for unsupervised deposition of ordered layers of two different monolayers on solid substrates, as well as all the System 1 and System 2 applications.

Configuration includes

  • The KSV 2000 Control Module
  • An Interface Unit
  • An alternating layer trough
  • An alternating dipper / substrate handling device
  • 2 film balances
  • 1 barrier drive

Unique Features

  • A Dipping well in the centre of the trough
  • An alternating dipping device, for fully automatic and software-controlled LB-film deposition on solid substrates

Common features

  • Symmetric or one-sided compression of the monolayer by two inter-linked surface barriers
  • Leak proof hydrophilic Delrin barriers (x4)
  • Form-sintered single piece, non-porous PTFE double trough. Surface area 2 x 930 cm2, (775 x 120 mm)
  • Subphase temperature control facilitated by aluminum heat/cool base plate operated by external circulating water bath (sold separately)
  • Digital display for surface pressure value
  • Super sensitive film balance with platinum Wilhelmy plate (51066), 100 paper plates (51066FP) and a hook for paper plates (51066FPH)
  • Complete KSV WINLB software for Windows operating systems
  • Comprehensive instruction manual and instructional video CD on how to set up the instrument and start making measurements
  • Complete starter kit to make your first measurements (see accessory KSV-LBKIT)
  • Optional remote control keypad for stand-alone use
  • Optional environmental chamber to protect the instrument from airborne particles and other disturbances

 

Specifications
Film balance measuring range   0 to 250 mN/m
Film balance resolution   0.004 mN/m
Barrier compression speed   0.1 to 800 mm/min (single sided compression)
0.1 to 400 mm/min (symmetric compression)
Dipping well dimensions
  37 x 116 x 93 mm (W x L x D)
Max. Substrate size
  100 x 100 mm (45 x 45 mm with minialternate trough)
Deposition speed
  0.1 to 85 or 0.2 to 170 mm/min
Speed adjustment
  0.1 mm/min increments
Deposition cycles
  1 to unlimited
Max stroke of arm
  145 mm
Delay times
  adjustable from 0 to 9999 s
Dipper motors
  4 Servo controlled DC motors
Effective trough dimensions   2 x (775 x 120 mm) (2 x (540 x 55 mm) with minialternate trough)
Subphase volume   5.5 l (0,95 l with minialternate trough)
Subphase temperature control
  0 to 60 degrees Celsius (by external bath)

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